Contract · Federal

Tabletop Maskless Aligner System

Agency: ENERGY, DEPARTMENT OF / ENERGY, DEPARTMENT OF
Location: Menlo Park, CA
Amount: Amount not listed
Posted: Sep 2, 2026
Set-aside: None (open competition)
NAICS code: 3333 look up NAICS codes
PSC code: AJ12

Timeline

Posted

Sep 2, 2026
Status

Closing soon

What contracts like this typically pay

No award history yet for this category (NAICS 3333).

What this contract is for

Agency: ENERGY, DEPARTMENT OF / ENERGY, DEPARTMENT OF
Location: Menlo Park, CA
NAICS: 3333
Scope: Federal

SLAC National Accelerator Laboratory is operated by Stanford University for the Department of Energy.

As a management and operating contractor, subcontracts awarded by the Laboratory are not Federal procurements, and are not directly subject to the Federal Acquisition Regulations in 48 CFR.

Nonetheless, certain Federal laws, Executive Orders, and regulations may affect our DOE approved purchasing system, as required by statute, regulation, or contract terms and conditions.

Please review the listed requirements and provide your best and final offer for both price and lead-time.

The follow has been attached for you to complete and review: (BAA) Buy American Act Certification Representations & Certifications Rider SubcontractorFormIIPP (onsite) Certificate of Insurance (onsite) Confirm Attached SLAC terms are accepted: FP Commercial Supplies-Services T&Cs (August 2023) Confirm Attached SLAC terms are accepted: SLAC General Terms and Conditions Supplemental Rider (Rev.

August 2026) Confirm Attached SLAC terms are accepted: Green On Site Services Rider(January 2025)/Non-Green On Site Services Rider(January 2025) Request for Quote: Required item(s) listed below: Tabletop maskless aligner system – QTY:1 Source selection will be based on Lowest Price and Technically Acceptable Method (LPTA).

Technical evaluation criteria are as follows: System Form Factor and Vibration Isolation: Tabletop maskless lithography system mounted on an anti-vibration table suitable for cleanroom installation.

Exposure Strategy and Modes: Dual exposure capability including raster mode and stitching-free mode.

Light source: for exposure of broadband and special i-line photoresists Resolution and Patterning Performance: Minimum feature size ?

0.6 µm Minimum lines and spaces ?

0.8 µm CD uniformity ?

0.2 µm (3?) 256...

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